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Insight into Electron Traps and Their Energy Distribution under Positive Bias Temperature Stress and Hot Carrier Aging

机译:正偏压温度应力和热载流子老化过程中电子陷阱及其能量分布的认识

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摘要

The access transistor of SRAM can suffer both Positive Bias Temperature Instability (PBTI) and Hot Carrier Aging (HCA) during operation. The understanding of electron traps (ETs) is still incomplete and there is little information on their similarity and differences under these two stress modes. The key objective of this paper is to investigate ETs in terms of energy distribution, charging and discharging properties, and generation. We found that both PBTI and HCA can charge ETs which center at 1.4eV below conduction band (Ec) of high-k (HK) dielectric, agreeing with theoretical calculation. For the first time, clear evidences are presented that HCA generates new ETs, which do not exist when stressed by PBTI. When charged, the generated ETs’ peak is 0.2eV deeper than that of pre-existing ETs. In contrast with the power law kinetics for charging the pre-existing ETs, filling the generated ETs saturates in seconds, even under an operation bias of 0.9 V. ET generation shortens device lifetime and must be included in modelling HCA. A cyclic and anti-neutralization ETs model (CAM) is proposed to explain PBTI and HCA degradation, which consists of pre-existing cyclic electron traps (PCET), generated cyclic electron traps (GCET), and anti-neutralization electron traps (ANET).
机译:SRAM的存取晶体管在工作期间会同时遭受正偏压温度不稳定性(PBTI)和热载流子老化(HCA)的影响。对电子陷阱(ETs)的理解仍然不完整,在这两种应力模式下关于它们的相似性和差异的信息很少。本文的主要目的是从能量分布,充放电特性和发电方面研究ET。我们发现PBTI和HCA都可以对以高k(HK)电介质的导带(Ec)下方1.4eV为中心的ET充电,这与理论计算相符。首次有明确的证据表明,HCA产生了新的ET,当PBTI施加压力时不存在。充电后,生成的ET的峰深比现有ET的深0.2eV。与为预先存在的ET充电的幂律动力学相反,即使在0.9 V的工作偏压下,填充生成的ET也会在几秒钟内达到饱和。ET生成会缩短设备寿命,并且必须包括在HCA模型中。为了解释PBTI和HCA的降解,提出了一种循环和抗中和的ETs模型(CAM),该模型由预先存在的循环电子陷阱(PCET),生成的循环电子陷阱(GCET)和抗中和电子陷阱(ANET)组成。 。

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